Molybdenum Sputtering Target
Molybdenum Sputtering Target Specification:
Product |
Available Size (mm) |
Density |
Purity |
Bonding Service |
|
Mo Sputtering Target |
Disc target:
OD10~1000 * 1~10 |
>99.5% |
≥99.95% |
Yes |
REQUEST A QUOTE |
Planar target:
1~10 * 20~1800 * 20~2300 |
Rotary Target:
OD140~180 * ID125~135 * 100~3300 |
Molybdenum Sputtering Target Description:
Quken provides molybdenum sputtering targets which are produced by crystallization, solid state and other ultra high purification processes. The denser the Molybdenum sputtering target is, the better the conductivity of the created layer.
Molybdenum sputtering target shares properties with its source material, silvery surface and hard, with a high melting point, are widely used in manufacturing memory devices, LCDs, electronic devices, integrated circuits and solar cell.
Molybdenum Sputtering Target Packaging:
Quken packages molybdenum sputtering targets in a vacuum package, to prevent materials contamination during transportation.
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