When working with a vacuum chamber and, specifically, a sputtering system, proper sputtering target handling is essential. Any residual buildup of grease, dust, and old coatings will trap water and other contaminants. This will hinder you from achieving a good vacuum as well as good quality deposited films. Dirty sputtering chambers, guns and targets will influence target arcing, surface roughness in deposited films, and trace chemical impurities.
Please find our suggestions as follows:
Metal sputtering targets can be cleaned using an alcohol wipe with a lint free cloth. A short period of pre-sputtering is recommended.
Oxide and ceramic sputtering targets can be cleaned using a non-impregnated “scotch bright” pad. After removing the contaminant, wipe the surface with alcohol using a lint free cloth. A short period of pre-sputtering is recommended.
It is highly recommended that you always keep your sputtering targets stored under vacuum before using. Our sputtering targets are packed in vacuum sealed poly bags.
Please do not touch the sputtering target with your bare hands. Gloves are required for the safe handling.