Compounds & Mixtures

Besides oxide, boride, carbide, fluoride, nitride, selenide, silicide, sulfide, and telluride sputtering targets, QUKEN can also customize other compounds and mixtures sputtering targets based on your specific requirements. Depending on the required materials, we employ various production methods include vacuum hot pressing, hot isostatic pressing, cold isostatic pressing, and cold press sintering. Our full analytic capability and complete machining capability ensures that our products will meet your composition, shape and purity requirements.

All compound and mixture sputtering targets are supplied with the appropriate Safety Data Sheets (SDS), and Certificate of Analysis (COA), relevant to the lot number supplied.

The following materials list is our standard range of compound and mixture sputtering targets. If you need something that is not listed, please make a request on the Quote Request page.

Let us know the material, composition, purity and dimensions you need. You may also upload a drawing (pdf file). We will try to meet your unique requirements.

Product Name Composition Purity
Barium Cerium Oxide Sputtering Target BaCeO3 3N
Barium Strontium Titanate Sputtering Target Ba0.5Sr0.5TiO3 3N
Barium Titanate Sputtering Target BaTiO3 3N
Barium Zirconate Sputtering Target BaZrO3 3N
Bismuth Ferrite Sputtering Target BiFeO3 3N
Bismuth Titanate Sputtering Target Bi4Ti3O12 3N
Bismuth Vanadate Sputtering Target BiVO4 3N
Calcium Manganate Sputtering Target CaMnO3 3N
Calcium Ruthenate Sputtering Target CaRuO3 3N
Calcium Zirconate Sputtering Target CaZrO3 3N
Chromium Silicon Monoxide Sputtering Target Cr/SiO 3N
Cobalt Ferrite Sputtering Target CoFe2O4 3N
Cobalt Silicide Sputtering Target CoSi2 2N
Copper Aluminate Sputtering Target CuAlO2 4N5
Fe2TiSi Sputtering Target Fe2TiSi 4N
Gadolinium Zirconate Sputtering Target Gd2Zr2O7 3N
Hydroxyapatite Sputtering Target Ca10(PO46(OH)2 3N
Indium Gallium Zinc Oxide Sputtering Target IGZO 4N
Iron Phosphide Sputtering Target FeP 4N
Lanthanum Aluminate Sputtering Target LaAlO3 3N
Lanthanum Chromite Sputtering Target LaCrO3 2N5
Lanthanum Manganate Sputtering Target LaMnO3 3N
Lanthanum Nickel Oxide Sputtering Target LaNiO3 2N, 3N
Lanthanum Strontium Manganate Sputtering Target La1xSrxMnO3 3N
Lanthanum Vanadium Sputtering Target LaVO3 3N
Lithium Cobalt Oxide Sputtering Target LiCoO2 3N
Lithium Iron Phosphate Sputtering Target LiFePO4, LFP 4N
Lithium Phosphate Sputtering Target Li3PO4 3N
In-doped LuFeO3 Sputtering Target LuFeO3+In 3N
Sc-doped LuFeO3 Sputtering Target LuFeO3+Sc 3N
Mullite (Al2O3-SiO2) Sputtering Target Al2O3+SiO2 4N
Nickel Cobalt Oxide Sputtering Target NiCo2O4 3N
Tin Niobate Sputtering Target SnNb2O6 4N
Lead Zirconium Titanate Sputtering Target PbZr0.2Ti0.8O3 2N5
Polycrystalline Silicon Sputtering Target Si 4N-6N
Polytetrafluoroethylene Sputtering Target PTFE 4N
Si2Ni Sputtering Target Si2Ni 4N
Si2Sn Sputtering Target Si2Sn 4N
Strontium Niobate Sputtering Target SrNbO3 3N
Strontium Ruthenate Sputtering Target SrRuO3 3N
Strontium Titanate Sputtering Target SrTiO3 3N, 4N
Strontium Zirconate Sputtering Target SrZrO3 4N
Titanium Carbonitride Sputtering Target TiCN 98%, 2N
Yttrium Iron Garnet Sputtering Target Y3Fe5O12 3N