Compounds & Mixtures

Besides oxide, boride, carbide, fluoride, nitride, selenide, silicide, sulfide, and telluride sputtering targets, QUKEN can also customize other compounds and mixtures sputtering targets based on your specific requirements. Depending on the required materials, we employ various production methods include vacuum hot pressing, hot isostatic pressing, cold isostatic pressing, and cold press sintering. Our full analytic capability and complete machining capability ensures that our products will meet your composition, shape and purity requirements.

All compound and mixture sputtering targets are supplied with the appropriate Safety Data Sheets (SDS), and Certificate of Analysis (COA), relevant to the lot number supplied.

The following materials list is our standard range of compound and mixture sputtering targets. If you need something that is not listed, please make a request on the Quote Request page.

Let us know the material, composition, purity and dimensions you need. You may also upload a drawing (pdf file). We will try to meet your unique requirements.

Product Name Composition Purity  
Barium Cerium Oxide Sputtering Target BaCeO3 3N Inquiry
Barium Strontium Titanate Sputtering Target Ba0.5Sr0.5TiO3 3N Inquiry
Barium Titanate Sputtering Target BaTiO3 3N Inquiry
Barium Zirconate Sputtering Target BaZrO3 3N Inquiry
Bismuth Ferrite Sputtering Target BiFeO3 3N Inquiry
Bismuth Titanate Sputtering Target Bi4Ti3O12 3N Inquiry
Bismuth Vanadate Sputtering Target BiVO4 3N Inquiry
Calcium Manganate Sputtering Target CaMnO3 3N Inquiry
Calcium Ruthenate Sputtering Target CaRuO3 3N Inquiry
Calcium Zirconate Sputtering Target CaZrO3 3N Inquiry
Chromium Silicon Monoxide Sputtering Target Cr/SiO 3N Inquiry
Cobalt Ferrite Sputtering Target CoFe2O4 3N Inquiry
Cobalt Silicide Sputtering Target CoSi2 2N Inquiry
Copper Aluminate Sputtering Target CuAlO2 4N5 Inquiry
Fe2TiSi Sputtering Target Fe2TiSi 4N Inquiry
Gadolinium Zirconate Sputtering Target Gd2Zr2O7 3N Inquiry
Hydroxyapatite Sputtering Target Ca10(PO46(OH)2 3N Inquiry
Indium Gallium Zinc Oxide Sputtering Target IGZO 4N Inquiry
Iron Phosphide Sputtering Target FeP 4N Inquiry
Lanthanum Aluminate Sputtering Target LaAlO3 3N Inquiry
Lanthanum Chromite Sputtering Target LaCrO3 2N5 Inquiry
Lanthanum Manganate Sputtering Target LaMnO3 3N Inquiry
Lanthanum Nickel Oxide Sputtering Target LaNiO3 2N, 3N Inquiry
Lanthanum Strontium Manganate Sputtering Target La1xSrxMnO3 3N Inquiry
Lanthanum Vanadium Sputtering Target LaVO3 3N Inquiry
Lithium Cobalt Oxide Sputtering Target LiCoO2 3N Inquiry
Lithium Iron Phosphate Sputtering Target LiFePO4, LFP 4N Inquiry
Lithium Phosphate Sputtering Target Li3PO4 3N Inquiry
In-doped LuFeO3 Sputtering Target LuFeO3+In 3N Inquiry
Sc-doped LuFeO3 Sputtering Target LuFeO3+Sc 3N Inquiry
Mullite (Al2O3-SiO2) Sputtering Target Al2O3+SiO2 4N Inquiry
Nickel Cobalt Oxide Sputtering Target NiCo2O4 3N Inquiry
Tin Niobate Sputtering Target SnNb2O6 4N Inquiry
Lead Zirconium Titanate Sputtering Target PbZr0.2Ti0.8O3 2N5 Inquiry
Polycrystalline Silicon Sputtering Target Si 4N-6N Inquiry
Polytetrafluoroethylene Sputtering Target PTFE 4N Inquiry
Si2Ni Sputtering Target Si2Ni 4N Inquiry
Si2Sn Sputtering Target Si2Sn 4N Inquiry
Strontium Niobate Sputtering Target SrNbO3 3N Inquiry
Strontium Ruthenate Sputtering Target SrRuO3 3N Inquiry
Strontium Titanate Sputtering Target SrTiO3 3N, 4N Inquiry
Strontium Zirconate Sputtering Target SrZrO3 4N Inquiry
Titanium Carbonitride Sputtering Target TiCN 98%, 2N Inquiry
Yttrium Iron Garnet Sputtering Target Y3Fe5O12 3N Inquiry