Oxides

Metal oxides are crystalline solids that contain a metal cation and an oxide anion. They typically react with water to form bases or with acids to form salts. Metal oxides display unique properties such as mechanical stress tolerance, high optical transparency, and exceptional carrier mobilities, etc.

Oxide sputtering targets exhibit excellent resistance to high temperatures, abrasives and chemicals. Although they have comparatively low densities, they are extremely hard but tend to be brittle. Oxide sputtering targets often need to be bonded to a metallic carrier. The better this bond provides mechanical, electrical and thermal contact, the better and longer the target works.

QUKEN provides a wide range of oxide sputtering targets to meet your composition, shape and purity requirements. Our full analytic capability and complete machining capability ensures that our products will meet your specific requirements.

All oxide sputtering targets are supplied with the appropriate Safety Data Sheets (SDS), and Certificate of Analysis (COA), relevant to the lot number supplied.

The following materials list is our standard range of oxide sputtering targets. If you need something that is not listed, please make a request on the Quote Request page.

Let us know the material, composition, purity and dimensions you need. You may also upload a drawing (pdf file). We will try to meet your unique requirements.

Product Name Composition Purity
Aluminum Oxide Sputtering Target Al2O3 3N-4N
Antimony-doped Tin Oxide Sputtering Target ATO 3N5
Cerium Oxide Sputtering Target CeO2 Ce/TREO : 3N-3N5 TREO: 2N min
Cerium Oxide (Cu-doped) Sputtering Target CeO2+Cu 3N
Cerium Oxide (Sm-doped) Sputtering Target CeO2+Sm 3N
Chromium Oxide Sputtering Target Cr2O3 3N
Copper Oxide Sputtering Target CuO 3N
Erbium Oxide Sputtering Target Er2O3 Er/TREO: 4N-5N TREO: 2N5-3N5
Gadolinium Oxide Sputtering Target Gd2O3 Gd2O3/TREO: 3N-4N5 TREO: 2N min
Hafnium Oxide Sputtering Targets HfO2 3N-4N
Indium Oxide Sputtering Target In2O3 4N
Indium Oxide (Cr-doped) Sputtering Target In2O3+Cr 3N
Indium Oxide (Fe-doped) Sputtering Target In2O3+Fe 3N
Indium Oxide (Ni-doped) Sputtering Target In2O3+Ni 3N
Indium Tin Oxide Sputtering Target ITO 4N-5N
Indium Zinc Oxide Sputtering Target IZO 4N-5N
Iridium Oxide Sputtering Target IrO2 3N
Iron Oxide Sputtering Target Fe2O3 3N
Iron Oxide Sputtering Target Fe3O4 3N
Lanthanum Oxide Sputtering Target La2O3 La2O3/TREO: 3N-4N TREO: 2N min
Lutetium Oxide Sputtering Target Lu2O3 Lu2O3/TREO: 3N-4N TREO: 2N min
Magnesium Oxide Sputtering Target MgO 4N
Manganese Oxide Sputtering Target MnO2 4N
Molybdenum Oxide Sputtering Target MoO3 4N
Neodymium Oxide Sputtering Target Nd2O3 Nd2O3/TREO: 3N-4N TREO: 2N min
Nickel Oxide Sputtering Target NiO 3N
Samarium Oxide Sputtering Target Sm2O3 Sm2O3/TREO: 3N-4N TREO: 2N min
Scandium Oxide Sputtering Target Sc2O3 Sc2O3/TREO: 4N-5N TREO: 2N5-3N5
Silicon Dioxide Sputtering Target SiO2 3N-5N
Silicon Dioxide (Nd-doped) Sputtering Target SiO2+Nd 4N
Silicon Monoxide Sputtering Target SiO 3N-4N
Strontium Oxide Sputtering Target SrO 3N
Tantalum Oxide Sputtering Target Ta2O5 4N
Tin Oxide Sputtering Target SnO2 4N
Tin Oxide (Cu-doped) Sputtering Target SnO2+Cu 3N
Tin Oxide (Fe-doped) Sputtering Target SnO2+Fe 3N
Tin Oxide (In2O3-doped) Sputtering Target SnO2+In2O3 4N
Tin Oxide (Ni-doped) Sputtering Target SnO2+Ni 3N
Tin Oxide (Sb-doped) Sputtering Target SnO2+Sb 3N
Titanium Dioxide Sputtering Target TiO2 3N-4N
Titanium Dioxide (Zr-doped) Sputtering Target TiO2+Zr 3N-4N
Titanium Rioxide Sputtering Target Ti2O3 3N5
Tungsten Oxide Sputtering Target WO3 3N
Vanadium Dioxide Sputtering Target VO2 3N
Ytterbium Oxide Sputtering Target Yb2O3 Yb2O3/TREO: 3N-4N TREO: 2N
Yttria Stabilized Zirconia Sputtering Target YSZ 4N
Yttrium Oxide Sputtering Target Y2O3 Y2O3/TREO: 3N-5N TREO: 2N-3N5
Zinc Oxide Sputtering Target ZnO 3N
Zinc Oxide (Al-doped) Sputtering Target AZO 4N-4N5
Zinc Oxide (B-doped) Sputtering Target ZnO+B 4N